Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527392 | 0.90 | PKM (0.44) | L3MBTL1PKMALDH1A1NPSR1CYP19A1 | |
| SCHEMBL25527291 | 0.82 | ALDH1A1 (0.43) | L3MBTL1PKMALDH1A1NPSR1CYP19A1 | |
| SCHEMBL25527396 | 0.81 | PKM (0.40) | L3MBTL1PKMALDH1A1NPSR1KMT2A | |
| SCHEMBL14802399 | 0.79 | ALDH1A1 (0.37) | L3MBTL1PKMALDH1A1NPSR1KMT2A | |
| SCHEMBL25946764 | 0.79 | PKM (0.44) | L3MBTL1PKMALDH1A1NPSR1CYP19A1 | |
| SCHEMBL22279604 | 0.79 | PKM (0.44) | L3MBTL1PKMALDH1A1NPSR1CYP19A1 | |
| SCHEMBL5607877 | 0.73 | ALDH1A1 (0.49) | L3MBTL1PKMALDH1A1NPSR1KMT2A | |
| SCHEMBL27297829 | 0.73 | PKM (0.35) | L3MBTL1PKMALDH1A1KMT2A | |
| SCHEMBL13943335 | 0.73 | ALDH1A1 (0.42) | L3MBTL1PKMALDH1A1NPSR1CYP19A1 | |
| SCHEMBL11966903 | 0.71 | ALDH1A1 (0.42) | L3MBTL1PKMALDH1A1NPSR1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |