SCHEMBL25527432

SCHEMBL25527432

O=C(O)CC(OC(=O)CS)C1CC2C=CC1C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.32
KDM4E B2RXH2 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527308 0.89 ACE (0.33) EPHX2
SCHEMBL25946694 0.86 EPHX2 (0.32) EPHX2KDM4ELMNA
SCHEMBL2070938 0.72 KDM4E (0.41) EPHX2KDM4ELMNA
SCHEMBL4743391 0.72 KDM4E (0.37) EPHX2KDM4ELMNA
SCHEMBL32688720 0.70 EPHX2 (0.33) EPHX2KDM4ELMNA
SCHEMBL25527439 0.70 ALDH1A1 (0.36) EPHX2LMNA
SCHEMBL12938373 0.70
SCHEMBL25527456 0.69 FFAR1 (0.32)
SCHEMBL6250343 0.69 ALDH1A1 (0.31) EPHX2
SCHEMBL15063320 0.69 ALDH1A1 (0.31) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed