Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | PGD | P52209 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP13 | P45452 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527280 | 0.85 | ACE (0.37) | TSHRPGDMMP1MMP2MMP3 | |
| SCHEMBL25946702 | 0.82 | MMP1 (0.33) | PGDMMP1MMP2MMP3MMP9 | |
| SCHEMBL25946800 | 0.81 | TSHR (0.39) | TSHRPGDMMP1MMP2MMP3 | |
| SCHEMBL25527409 | 0.76 | TSHR (0.39) | TSHRHSD17B10MMP1MMP2MMP3 | |
| SCHEMBL25527411 | 0.74 | TSHR (0.41) | TSHRHSD17B10MMP1MMP2MMP3 | |
| SCHEMBL8747760 | 0.73 | TSHR (0.44) | TSHRHSD17B10 | |
| SCHEMBL7783980 | 0.73 | PGD (0.37) | TSHRPGDALOX15SLC22A6LMNA | |
| SCHEMBL29101123 | 0.71 | TSHR (0.37) | TSHRHSD17B10ALOX15SLC22A6LMNA | |
| SCHEMBL25527412 | 0.71 | CYP1A2 (0.42) | TSHRHSD17B10ALOX15LMNASMN1; SMN2 | |
| SCHEMBL18673823 | 0.70 | TSHR (0.31) | TSHRHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |