SCHEMBL25528050

SCHEMBL25528050

BCc1c(B)c(CB)c(C(=O)OCCS(=O)(=O)O)c(C(=O)OC2CCCC2)c1B

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ STS P08842 4/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25528052 0.99 STS (0.32) STS
SCHEMBL25913783 0.93 STS (0.30) STS
SCHEMBL25913785 0.92 STS (0.32) STS
SCHEMBL25476274 0.89 STS (0.33) STS
SCHEMBL25476275 0.88 STS (0.34) STS
SCHEMBL25528065 0.82 — —
SCHEMBL25527951 0.81 — —
SCHEMBL25528040 0.81 — —
SCHEMBL25528042 0.81 SMN1; SMN2 (0.33) —
SCHEMBL25528037 0.80 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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