SCHEMBL25528040

SCHEMBL25528040

BCc1c(B)c(CB)c(C(=O)OCCS(=O)(=O)O)c(C(=O)OC)c1B

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25913787 0.92 — —
SCHEMBL25528042 0.90 SMN1; SMN2 (0.33) —
SCHEMBL25476266 0.88 NPC1 (0.31) —
SCHEMBL25527951 0.87 — —
SCHEMBL25528037 0.86 — —
SCHEMBL25913789 0.82 SMN1; SMN2 (0.33) —
SCHEMBL25528050 0.81 STS (0.30) —
SCHEMBL25528038 0.81 ALDH1A1 (0.30) —
SCHEMBL25528056 0.80 — —
SCHEMBL25913793 0.78 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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