SCHEMBL25913785

SCHEMBL25913785

BCc1c(B)c(C(=O)OC2CCCCC2)c(C(=O)OCCS(=O)(=O)O)c(CB)c1CB

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ STS P08842 4/20 0.32
▸ MMP2 P08253 1/20 0.30
▸ MMP9 P14780 1/20 0.30
▸ MMP12 P39900 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25913783 0.99 STS (0.30) STS
SCHEMBL25476275 0.94 STS (0.34) STSMMP2MMP9MMP12
SCHEMBL25528052 0.93 STS (0.32) STSMMP2MMP9MMP12
SCHEMBL25476274 0.93 STS (0.33) STSMMP2MMP9MMP12
SCHEMBL25528050 0.92 STS (0.30) STS
SCHEMBL25913777 0.81 — —
SCHEMBL25913787 0.80 — —
SCHEMBL25913789 0.80 SMN1; SMN2 (0.33) —
SCHEMBL25913793 0.80 — —
SCHEMBL25913792 0.79 ALDH1A1 (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236503-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-27 — — US disclosed
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