SCHEMBL25564232

SCHEMBL25564232

CC(=O)OC1(c2cc(F)cc(F)c2)CCCCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 2/20 0.37
HDAC1 Q13547 2/20 0.37
HDAC2 Q92769 2/20 0.37
HDAC6 Q9UBN7 2/20 0.37
DRD2 P14416 1/20 0.36
DRD4 P21917 1/20 0.36
DRD3 P35462 1/20 0.36
HSD11B1 P28845 2/20 0.34
HDAC4 P56524 1/20 0.33
CTSD P07339 1/20 0.33
BACE1 P56817 1/20 0.33
RIPK1 Q13546 1/20 0.33
MAPT P10636 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
SLC6A3 Q01959 4/20 0.33
SLC6A4 P31645 3/20 0.33
SLC6A2 P23975 2/20 0.32
HCAR3 P49019 1/20 0.32
HCAR2 Q8TDS4 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25564311 1.00 HDAC3 (0.37) HDAC3HDAC1HDAC2HDAC6DRD2
SCHEMBL25564314 1.00 HDAC3 (0.37) HDAC3HDAC1HDAC2HDAC6DRD2
SCHEMBL25564135 0.98 DRD2 (0.37) HDAC3HDAC1HDAC2HDAC6DRD2
SCHEMBL25564318 0.84 SLC6A4 (0.47) HDAC3HDAC1HDAC2HDAC6HSD11B1
SCHEMBL25564238 0.84 SLC6A4 (0.47) HDAC3HDAC1HDAC2HDAC6HSD11B1
SCHEMBL25564306 0.84 SLC6A4 (0.47) HDAC3HDAC1HDAC2HDAC6HSD11B1
SCHEMBL25564307 0.83 DRD2 (0.49) HDAC3HDAC1HDAC2HDAC6DRD2
SCHEMBL25564223 0.83 DRD2 (0.49) HDAC3HDAC1HDAC2HDAC6DRD2
SCHEMBL25564309 0.83 DRD2 (0.49) HDAC3HDAC1HDAC2HDAC6DRD2
SCHEMBL25564130 0.81 DRD2 (0.50) DRD2DRD4DRD3HSD11B1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367213-A1 MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-16 US disclosed
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20230161254-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed