Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD2 | P14416 | 3/20 | 0.49 |
| ▸ | DRD4 | P21917 | 3/20 | 0.49 |
| ▸ | DRD3 | P35462 | 3/20 | 0.49 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.47 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.37 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.37 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564223 | 1.00 | DRD2 (0.49) | DRD2DRD4DRD3HSD11B1SLC6A3 | |
| SCHEMBL25564309 | 1.00 | DRD2 (0.49) | DRD2DRD4DRD3HSD11B1SLC6A3 | |
| SCHEMBL25564130 | 0.98 | DRD2 (0.50) | DRD2DRD4DRD3HSD11B1SLC6A3 | |
| SCHEMBL25564270 | 0.85 | SLC6A3 (0.49) | DRD2DRD4DRD3HSD11B1SLC6A3 | |
| SCHEMBL7915820 | 0.85 | LMNA (0.40) | DRD2DRD4DRD3MAPTSMN1; SMN2 | |
| SCHEMBL26059382 | 0.85 | ESR2 (0.48) | DRD2DRD4DRD3SLC6A3SLC6A4 | |
| SCHEMBL25564667 | 0.84 | HSD11B1 (0.43) | DRD2DRD4DRD3HSD11B1SLC6A3 | |
| SCHEMBL6036853 | 0.84 | DRD2 (0.47) | DRD2DRD4DRD3HSD11B1OPRM1 | |
| SCHEMBL25564232 | 0.83 | HDAC3 (0.37) | DRD2DRD4DRD3HSD11B1SLC6A3 | |
| SCHEMBL25564314 | 0.83 | HDAC3 (0.37) | DRD2DRD4DRD3HSD11B1SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |