⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24268515 | 0.93 | — | — | |
| SCHEMBL25564352 | 0.87 | — | — | |
| SCHEMBL24268517 | 0.86 | PTPN2 (0.30) | — | |
| SCHEMBL18232582 | 0.83 | — | — | |
| SCHEMBL23351279 | 0.82 | KCNH2 (0.33) | — | |
| SCHEMBL24268479 | 0.81 | — | — | |
| SCHEMBL26233735 | 0.80 | — | — | |
| SCHEMBL26059447 | 0.80 | — | — | |
| SCHEMBL24268499 | 0.79 | — | — | |
| SCHEMBL23351106 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |