Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14827329 | 0.89 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL25900984 | 0.84 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL25574915 | 0.83 | — | — | |
| SCHEMBL1142001 | 0.81 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL12184238 | 0.80 | KDM4E (0.39) | KDM4EALDH1A1ATM | |
| SCHEMBL13461814 | 0.80 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL14825594 | 0.79 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL13461819 | 0.79 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL25896563 | 0.78 | — | — | |
| SCHEMBL23077918 | 0.77 | HTT (0.33) | KDM4EALDH1A1NPC1POLBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |