⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25900984 | 0.89 | KDM4E (0.31) | — | |
| SCHEMBL14827329 | 0.82 | KDM4E (0.31) | — | |
| SCHEMBL1142001 | 0.81 | KDM4E (0.33) | — | |
| SCHEMBL13461814 | 0.80 | KDM4E (0.32) | — | |
| SCHEMBL13461819 | 0.79 | KDM4E (0.32) | — | |
| SCHEMBL25564675 | 0.78 | KDM4E (0.31) | — | |
| SCHEMBL12184254 | 0.77 | MAOB (0.35) | — | |
| SCHEMBL1141598 | 0.77 | NPC1 (0.33) | — | |
| SCHEMBL25454344 | 0.77 | — | — | |
| SCHEMBL14825594 | 0.77 | KDM4E (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023140231-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |