SCHEMBL255879

SCHEMBL255879

C=C(C)C(=O)OCCCC(C)=O

nearest known ligand 0.62

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.62
THRB P10828 1/20 0.53
POLB P06746 1/20 0.46
APEX1 P27695 1/20 0.46
HTT P42858 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
ALDH1A1 P00352 5/20 0.41
PAOX Q6QHF9 2/20 0.37
ACHE P22303 1/20 0.37
HPGD P15428 1/20 0.32
LMNA P02545 1/20 0.32
SLC15A2 Q16348 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CYP3A4 P08684 1/20 0.31
MAPT P10636 1/20 0.30
BLM P54132 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9580313 0.94 TSHR (0.66) TSHRTHRBPOLBAPEX1HTT
SCHEMBL15478764 0.92 TSHR (0.69) TSHRTHRBPOLBAPEX1HTT
SCHEMBL7520391 0.92 TSHR (0.69) TSHRTHRBPOLBAPEX1HTT
SCHEMBL28998251 0.92 TSHR (0.69) TSHRTHRBPOLBAPEX1HTT
SCHEMBL28998257 0.92 TSHR (0.69) TSHRTHRBPOLBAPEX1HTT
SCHEMBL7919723 0.87 TSHR (0.62) TSHRTHRBPOLBAPEX1HTT
SCHEMBL22440439 0.87 TSHR (0.62) TSHRTHRBPOLBAPEX1HTT
SCHEMBL2453478 0.86 THRB (0.57) TSHRTHRBPOLBAPEX1HTT
SCHEMBL25426 0.86 TSHR (0.79) TSHRTHRBPOLBAPEX1HTT
SCHEMBL5144090 0.86 TSHR (0.79) TSHRTHRBPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119019615-A Hydrolysis-resistant photosensitive resin for deep sea pressure sensor and preparation method thereof 中国科学院宁波材料技术与工程研究所 2024-11-26 CN disclosed
CN-118169970-A Method for manufacturing semiconductor device and CMOS image sensor 台湾积体电路制造股份有限公司 2024-06-11 CN disclosed
CN-117700648-A 3D printing resin material, 3D printing elastomer and preparation method thereof 甬江实验室 2024-03-15 CN disclosed
US-20230323117-A1 RESIN MATERIALS FOR MAKING THREE-DIMENSIONAL OBJECTS AND METHODS OF USING THE SAME LUXCREO (BEIJING) INC. (CN) 2023-10-12 US disclosed
US-11713395-B2 Resin materials for making three-dimensional objects and methods of using the same LUXCREO (BEIJING) INC. (CN) 2023-08-01 US disclosed
US-20230203221-A1 MONOMERS, POLYMERS, AND ARTICLES FOR BIOMATERIAL CAPTURE SOLVENTUM INTELLECTUAL PROPERTIES COMPANY 2023-06-29 US disclosed
CN-112399977-B Resin material for producing three-dimensional object and method of using the same 清锋(北京)科技有限公司 2022-09-27 CN disclosed
CN-112399977-A Resin material for producing three-dimensional object and method of using the same 清锋(北京)科技有限公司 2021-02-23 CN disclosed
US-20180171046-A1 Improved Process to Make Tubular Ethylene Based Polymers with High Melt Strength DOW GLOBAL TECHNOLOGIES LLC 2018-06-21 US disclosed
US-20180120703-A1 PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-20130109777-A1 DENTAL COMPOSITION, KIT OF PARTS AND USE THEREOF 3M INNOVATIVE PROPERTIES COMPANY (US) 2013-05-02 US disclosed
WO-2012030518-A1 PHOTOCHROMIC MATERIALS HAVING EXTENDED PI-CONJUGATED SYSTEMS AND COMPOSITIONS AND ARTICLES INCLUDING THE SAME TRANSITIONS OPTICAL, INC. (US) 2012-03-08 WO disclosed
US-20110190467-A1 Biological Polysiloxanes VISION CRC LIMITED (AU) 2011-08-04 US disclosed
EP-1616854-B1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHINETSU CHEMICAL CO (JP) 2007-09-05 EP disclosed
US-7202318-B2 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-04-10 US disclosed
EP-1616854-A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-01-18 EP disclosed
US-20060009602-A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-01-12 US disclosed
US-4291953-A CONTACT LENSES PERMAVISION (US) 1981-09-29 US disclosed
US-4182723-A WETTABLE CONTACT LENS PERMAVISION (US) 1980-01-08 US disclosed
US-4169119-A Method of molding an ocular membrane PERMAVISION (US) 1979-09-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060009602-A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process HRH3, SUV39H2, SUV39H1 TSHR 705/4885THRB 1276/4885POLB 1422/4885
US-20130109777-A1 DENTAL COMPOSITION, KIT OF PARTS AND USE THEREOF KIT, KDM5C, PHAX TSHR 4041/4885THRB 851/4885POLB 186/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.