SCHEMBL25614134

SCHEMBL25614134

CCc1c(C#N)ccnc1C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS3 P29474 1/20 0.40
NOS2 P35228 1/20 0.40
KDM5A P29375 4/20 0.39
KDM4E B2RXH2 2/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
KDM4C Q9H3R0 1/20 0.38
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
HPGD P15428 1/20 0.36
CYP2C19 P33261 1/20 0.36
USP7 Q93009 2/20 0.35
LRRK2 Q5S007 4/20 0.34
HTT P42858 1/20 0.34
TSHR P16473 1/20 0.33
ROCK2 O75116 2/20 0.33
ROCK1 Q13464 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7215701 0.81 HPGD (0.36) NOS3NOS2KDM5AKDM4EALDH1A1
SCHEMBL6637905 0.79 USP7 (0.39) NOS3NOS2KDM5AKDM4EALDH1A1
SCHEMBL16884625 0.79 LRRK2 (0.37) NOS3NOS2KDM5AKDM4EALDH1A1
SCHEMBL3671909 0.75 TSHR (0.38) NOS3NOS2ALDH1A1CYP1A2CYP2C9
SCHEMBL25983686 0.75 AR (0.35) NOS3NOS2KDM4ELMNACYP1A2
SCHEMBL22890754 0.74 LRRK2 (0.44) KDM5AKDM4EALDH1A1CYP1A2CYP3A4
SCHEMBL15680079 0.74 ROCK2 (0.39) KDM4EALDH1A1LMNALRRK2HTT
SCHEMBL17859388 0.73 HSD17B10 (0.38) NOS3NOS2KDM4EALDH1A1HSD17B10
SCHEMBL22890763 0.73 BRD4 (0.44) KDM4EALDH1A1HSD17B10HPGDLRRK2
SCHEMBL10376318 0.73 HPGD (0.38) NOS2KDM4EALDH1A1HSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4199131-A1 A CE(IV) METAL COMPLEX, AN ORGANIC ELECTRONIC DEVICE COMPRISING AN ANODE LAYER, A CATHODE LAYER AND A CHARGE GENERATION LAYER, WHEREIN THE CHARGE GENERATION LAYER COMPRISES A P-TYPE CHARGE GENERATION LAYER THAT COMPRISES THE CE(IV) METAL COMPLEX AND A N-TYPE CHARGE GENERATION LAYER Novaled GmbH (DE) 2023-06-21 EP disclosed