Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 11/20 | 0.45 |
| ▸ | DGKA | P23743 | 1/20 | 0.41 |
| ▸ | HTR2C | P28335 | 1/20 | 0.38 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16814874 | 0.86 | DGKA (0.47) | EPHX2DGKAHTR2CNAAAALDH1A1 | |
| SCHEMBL29549657 | 0.86 | DGKA (0.50) | EPHX2DGKAHTR2CNAAAALDH1A1 | |
| SCHEMBL28820927 | 0.82 | DGKA (0.50) | EPHX2DGKAHTR2CNAAAALDH1A1 | |
| SCHEMBL18826744 | 0.82 | MAPT (0.33) | EPHX2ALDH1A1MAPT | |
| SCHEMBL8413450 | 0.81 | MEN1 (0.52) | EPHX2DGKANAAAALDH1A1MAPT | |
| SCHEMBL29549695 | 0.81 | NAAA (0.53) | EPHX2DGKAHTR2CNAAA | |
| SCHEMBL28594649 | 0.80 | DGKA (0.44) | EPHX2DGKAHTR2CNAAAALDH1A1 | |
| SCHEMBL31307903 | 0.80 | NAAA (0.56) | EPHX2DGKAHTR2CNAAA | |
| SCHEMBL29549964 | 0.80 | NAAA (0.56) | EPHX2DGKAHTR2CNAAA | |
| SCHEMBL31307933 | 0.80 | NAAA (0.56) | EPHX2DGKAHTR2CNAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |