SCHEMBL25639155

SCHEMBL25639155

Cc1cc(N(c2ccc(N(c3ccc(C(F)(F)F)cc3)c3c(F)c(F)c(C(F)(F)F)c(F)c3F)cc2)c2cc(C)cc(C(F)(F)F)c2)cc(C(F)(F)F)c1

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
GRIN2B Q13224 1/20 0.32
IDH1 O75874 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254822 0.92 TACR1 (0.34)
SCHEMBL24254752 0.91 KIF11 (0.31)
SCHEMBL24254746 0.91 KIF11 (0.31)
SCHEMBL24254747 0.90
SCHEMBL24254823 0.90 TACR1 (0.34)
SCHEMBL25639243 0.89 GRIN2B (0.32) GRIN2BIDH1
SCHEMBL24254825 0.89 KIF11 (0.36)
SCHEMBL24254648 0.89
SCHEMBL24254832 0.87 RAPGEF4 (0.32)
SCHEMBL24254651 0.87 HTT (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed