⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25715627 | 0.81 | — | — | |
| SCHEMBL24059246 | 0.72 | ALDH1A1 (0.32) | — | |
| SCHEMBL25713620 | 0.70 | CA12 (0.31) | — | |
| SCHEMBL22503073 | 0.65 | EPHX1 (0.47) | — | |
| SCHEMBL24028212 | 0.63 | HDAC3 (0.35) | — | |
| SCHEMBL27445681 | 0.62 | HDAC3 (0.36) | — | |
| SCHEMBL24028729 | 0.61 | CA1 (0.33) | — | |
| SCHEMBL22503072 | 0.61 | EPHX1 (0.50) | — | |
| SCHEMBL25713582 | 0.61 | CA1 (0.35) | — | |
| SCHEMBL22503126 | 0.60 | EPHX1 (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161249-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |