SCHEMBL25715531

SCHEMBL25715531

CCCCCC(CC)NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)C(C#N)S(=O)(=O)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25715538 0.80 CA1 (0.35)
SCHEMBL25716417 0.78 EPHX1 (0.31) EPHX1
SCHEMBL25715313 0.73 CA1 (0.35)
SCHEMBL24059213 0.71 CA1 (0.35)
SCHEMBL25519813 0.68 EPHX1 (0.55) EPHX1
SCHEMBL25715752 0.65
Lithium SCHEMBL30996490 0.63 CA1 (0.30)
SCHEMBL13959232 0.63 CA2 (0.36) EPHX1
SCHEMBL24059246 0.61 ALDH1A1 (0.32)
SCHEMBL14473485 0.61 TP53 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161249-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2023-05-25 US disclosed