SCHEMBL2572167

SCHEMBL2572167

CCOCCN(CCOCC)c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.44
TSHR P16473 2/20 0.44
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
TP53 P04637 1/20 0.39
NCF1 P14598 1/20 0.39
TAAR1 Q96RJ0 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
PPARG P37231 1/20 0.38
MEN1 O00255 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
KMT2A Q03164 1/20 0.36
CNR2 P34972 1/20 0.36
EGFR P00533 1/20 0.36
ERBB2 P04626 1/20 0.36
NAMPT P43490 1/20 0.35
ALDH1A1 P00352 1/20 0.35
GLA P06280 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8391497 0.92 TSHR (0.50) ALOX15TSHRESR1ESR2TAAR1
SCHEMBL18177924 0.91 ALOX15 (0.39) ALOX15TSHRESR1ESR2TP53
SCHEMBL10771765 0.89 TSHR (0.44) ALOX15TSHRESR1ESR2TP53
SCHEMBL12525219 0.89 ALOX15 (0.41) ALOX15TSHRESR1ESR2MEN1
SCHEMBL11730500 0.89 TSHR (0.47) ALOX15TSHRESR1ESR2TAAR1
SCHEMBL28590651 0.87 USP2 (0.41) ALOX15TSHRESR1ESR2TP53
SCHEMBL10620092 0.84 ALDH1A1 (0.49) ALOX15TSHRESR1ESR2SMN1; SMN2
SCHEMBL11507076 0.83 TSHR (0.53) TSHRTAAR1SMN1; SMN2MEN1CYP3A4
SCHEMBL11718470 0.83 SMN1; SMN2 (0.57) TP53SMN1; SMN2PPARGALDH1A1
SCHEMBL10529000 0.82 TSHR (0.44) TSHRCYP2C9CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1906238-B1 Photosensitive composition and pattern forming method using the same FUJIFILM CORP (JP) 2011-11-09 EP disclosed
US-7824836-B2 Photosensitive composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-11-02 US disclosed
US-20080274421-A1 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-11-06 US disclosed
EP-1906238-A2 Photosensitive composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
US-4997918-A Benzthiazolium azo dyes CIBA-GEIGY CORPORATION (US) 1991-03-05 US disclosed
US-4845235-A Pyrroline derivative NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1989-07-04 US disclosed
EP-0105031-B1 CATIONIC AZO DYESTUFFS CIBA-GEIGY AG (CH) 1989-01-04 EP disclosed
EP-0105031-A2 Cationic azo dyestuffs CIBA-GEIGY AG (CH) 1984-04-04 EP disclosed
US-RE29834-E PREPARED FROM 4-SULFONYL-1,8-NAPHTHOLACTAMS BAYER AKTIENGESELLSCHAFT (DE) 1978-11-14 US disclosed
US-4045458-A FRIEDEL-CRAFTS CATALYSTS KANZAKI PAPER MANUFACTURING CO., LTD. (JA) 1977-08-30 US disclosed
US-3997519-A Method of producing quaternary pyridinium compounds GAF CORPORATION (US) 1976-12-14 US disclosed
US-3930671-A Color former and pressure-sensitive copying paper FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed