SCHEMBL25736655

SCHEMBL25736655

CN(CCCS)C(=O)OC(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 2/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC2 Q92769 1/20 0.38
CA14 Q9ULX7 2/20 0.37
CTSK P43235 3/20 0.35
PDK2 Q15119 1/20 0.34
LMNA P02545 1/20 0.33
GBA1 P04062 1/20 0.33
METAP2 P50579 1/20 0.32
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM5 P08912 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRNB2 P17787 1/20 0.31
CHRM3 P20309 1/20 0.31
CHRNA4 P43681 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
TRPV4 Q9HBA0 1/20 0.31
FPR3 P25089 1/20 0.31
FPR2 P25090 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25795585 0.88 HDAC6 (0.36) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL7244461 0.86 HDAC6 (0.39) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL25720861 0.85 ALDH1A1 (0.42) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL10260946 0.83 HDAC6 (0.40) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL1094425 0.82 TDP1 (0.42) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL3161490 0.82 CA12 (0.39) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL19699862 0.82 CHRM2 (0.39) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL2344511 0.81 HDAC6 (0.39) HDAC6HDAC1HDAC2CA14CTSK
SCHEMBL14280284 0.81 GBA1 (0.34) HDAC6HDAC1HDAC2CA14PDK2
SCHEMBL5568004 0.81 CA14 (0.36) HDAC6HDAC1HDAC2CA14CTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed