Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 4/20 | 0.58 |
| ▸ | CTSS | P25774 | 3/20 | 0.58 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.43 |
| ▸ | CTSL | P07711 | 1/20 | 0.42 |
| ▸ | CTSB | P07858 | 1/20 | 0.42 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.41 |
| ▸ | PPARA | Q07869 | 2/20 | 0.41 |
| ▸ | PPARG | P37231 | 1/20 | 0.41 |
| ▸ | SYK | P43405 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16789064 | 0.87 | CTSK (0.56) | CTSKCTSSMAPTS1PR3 | |
| SCHEMBL11638583 | 0.86 | CTSK (0.60) | CTSKCTSSS1PR3 | |
| SCHEMBL11638585 | 0.86 | CTSK (0.60) | CTSKCTSSS1PR3 | |
| SCHEMBL16789067 | 0.85 | CTSK (0.54) | CTSKCTSSMAPTS1PR3 | |
| SCHEMBL27833801 | 0.85 | CTSK (0.62) | CTSKCTSSMAPTS1PR3ATM | |
| SCHEMBL10240502 | 0.85 | CTSK (0.62) | CTSKCTSSMAPTS1PR3ATM | |
| SCHEMBL18435386 | 0.84 | CTSK (0.64) | CTSKCTSSMAPTS1PR3ATM | |
| SCHEMBL9089121 | 0.84 | CTSK (0.61) | CTSKCTSSMAPTS1PR3ATM | |
| SCHEMBL1951343 | 0.83 | CTSK (0.63) | CTSKCTSSMAPTS1PR3ATM | |
| SCHEMBL1095762 | 0.83 | CTSK (0.63) | CTSKCTSSMAPTS1PR3ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |