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SCHEMBL25737166

SCHEMBL25737166

CC(C)(C)OC(=O)N1C(C)(C)CC(OC(=O)CS)CC1(C)C

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ CTSK P43235 1/20 0.33
▸ NR1H2 P55055 1/20 0.33
▸ EPHX2 P34913 1/20 0.32
▸ CHRM2 P08172 1/20 0.32
▸ CHRM1 P11229 1/20 0.32
▸ CHRM3 P20309 1/20 0.32
▸ USP2 O75604 1/20 0.30
▸ SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25736676 0.89 CTSK (0.32) CTSKNR1H2EPHX2CHRM2CHRM1
SCHEMBL25737196 0.83 NR1H2 (0.34) CTSKNR1H2EPHX2CHRM2CHRM1
SCHEMBL25737175 0.81 CTSK (0.31) CTSKNR1H2USP2SMN1; SMN2
SCHEMBL17921284 0.79 SPHK1 (0.33) CTSKNR1H2EPHX2CHRM2CHRM1
SCHEMBL10329352 0.78 ALDH1A1 (0.31) —
SCHEMBL10329349 0.77 TSHR (0.34) CTSKNR1H2EPHX2CHRM2CHRM1
SCHEMBL25475317 0.77 TSHR (0.34) SMN1; SMN2
SCHEMBL25736757 0.76 NR1H2 (0.49) NR1H2USP2SMN1; SMN2
SCHEMBL15769252 0.75 CHRM2 (0.46) CTSKNR1H2EPHX2CHRM2CHRM1
SCHEMBL10329361 0.75 TSHR (0.35) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed