SCHEMBL25738396

SCHEMBL25738396

CCCSCCSc1ccc(C(C)(C)C)c2ccccc12

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ PTGS2 P35354 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25934905 0.91 — —
SCHEMBL25738393 0.81 LMNA (0.41) PTGS2
SCHEMBL25934910 0.79 LMNA (0.39) PTGS2
SCHEMBL25738394 0.78 IDO1 (0.43) PTGS2
SCHEMBL5517816 0.71 ALDH1A1 (0.48) —
SCHEMBL25738395 0.70 MEN1 (0.36) PTGS2
SCHEMBL9914279 0.68 TSHR (0.38) —
SCHEMBL25934912 0.68 IDO1 (0.43) —
SCHEMBL15521602 0.66 IDO1 (0.46) PTGS2
SCHEMBL16683596 0.65 ALDH1A1 (0.46) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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