⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8652409 | 0.91 | — | — | |
| SCHEMBL5745619 | 0.88 | LMNA (0.30) | — | |
| SCHEMBL2572609 | 0.88 | LMNA (0.30) | — | |
| SCHEMBL2572293 | 0.88 | LMNA (0.30) | — | |
| SCHEMBL5745624 | 0.88 | LMNA (0.30) | — | |
| SCHEMBL19638406 | 0.85 | LMNA (0.31) | — | |
| SCHEMBL1711109 | 0.71 | — | — | |
| SCHEMBL19219867 | 0.71 | — | — | |
| SCHEMBL22790683 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL2283214 | 0.71 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1637526-B1 | CURABLE POLYCYCLIC COMPOUNDS AND PROCESS FOR THE PRODUCTION THEREOF | TOKUYAMA CORP (JP) | 2011-11-09 | — | — | EP | disclosed |
| US-7754903-B2 | adamantyl diglycidyl ether or 1-adamantanol epichlorohydrin adduct curable to polyepoxides; encapsulant for light-emitting diode; superior optical properties, heat resistance, photostability, and shrinkage inhibition | TOKUYAMA CORPORATION (JP) | 2010-07-13 | — | — | US | disclosed |
| CN-100413855-C | Curable polycyclic compound and process for producing the same | TOKUYAMA CORP (JP) | 2008-08-27 | — | — | CN | disclosed |
| US-20060252911-A1 | adamantyl diglycidyl ether or 1-adamantanol epichlorohydrin adduct curable to polyepoxides; encapsulant for light-emitting diode; superior optical properties, heat resistance, photostability, and shrinkage inhibition | TOKYUYAMA CORPORATION (JP) | 2006-11-09 | — | — | US | disclosed |
| CN-1809548-A | Curable polycyclic compound and process for producing the same | TOKUYAMA CORP (JP) | 2006-07-26 | — | — | CN | disclosed |
| EP-1637526-A1 | CURABLE POLYCYCLIC COMPOUNDS AND PROCESS FOR THE PRODUCTION THEREOF | TOKUYAMA CORPORATION (JP) | 2006-03-22 | — | — | EP | disclosed |