Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704975 | 0.77 | TSHR (0.42) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL8655279 | 0.72 | TSHR (0.38) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL28060791 | 0.69 | TSHR (0.50) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL21237064 | 0.67 | TSHR (0.47) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL27148948 | 0.67 | TSHR (0.40) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL216519 | 0.66 | TSHR (0.41) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL27819753 | 0.66 | TSHR (0.53) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL14492394 | 0.65 | TDP1 (0.43) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL12589317 | 0.65 | POLB (0.39) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL10939360 | 0.65 | LMNA (0.31) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9946158-B2 | Composition for forming resist underlayer film for nanoimprint | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| EP-2461350-B1 | USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-20150099070-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL IND LTD (JP) | 2015-04-09 | — | — | US | disclosed |
| EP-2461350-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20120128891-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8048615-B2 | Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20090162782-A1 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| EP-1972998-A1 | SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-09-24 | — | — | EP | disclosed |