SCHEMBL25802457

SCHEMBL25802457

O=C(Oc1ccc(I)cc1)c1ccc(NS(=O)(=O)C(F)(F)F)s1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 1/20 0.38
▸ TRPV1 Q8NER1 1/20 0.38
▸ KMT2A Q03164 3/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ PPARA Q07869 1/20 0.33
▸ PRSS1 P07477 5/20 0.33
▸ TMPRSS15 P98073 5/20 0.33
▸ ALDH1A1 P00352 1/20 0.32
▸ HPGD P15428 1/20 0.32
▸ TSHR P16473 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ PPARG P37231 1/20 0.32
▸ NCOA2 Q15596 1/20 0.32
▸ NCOA1 Q15788 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ NCOA3 Q9Y6Q9 1/20 0.32
▸ ERCC5 P28715 1/20 0.32
▸ FEN1 P39748 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25802460 0.72 KDM4E (0.42) PTPN1TRPV1KMT2AMAPK1SMN1; SMN2
SCHEMBL26343833 0.71 PTPN1 (0.40) PTPN1TRPV1MAPK1SMN1; SMN2CA2
SCHEMBL25803086 0.68 ELANE (0.43) PTPN1TRPV1MAPK1SMN1; SMN2CA2
SCHEMBL23843700 0.68 PTPN1 (0.37) PTPN1TRPV1KMT2AMAPK1SMN1; SMN2
SCHEMBL24054814 0.66 PTPN1 (0.49) PTPN1TRPV1KMT2AMAPK1SMN1; SMN2
SCHEMBL25802961 0.65 PTPN1 (0.63) PTPN1MAPK1SMN1; SMN2PPARAPPARG
SCHEMBL15116360 0.62 PTPN1 (0.65) PTPN1KMT2AMAPK1SMN1; SMN2PPARA
SCHEMBL326469 0.61 ELANE (0.44) TRPV1CA2CA1CA9
SCHEMBL6428635 0.61 PTPN1 (0.73) PTPN1MAPK1SMN1; SMN2ALDH1A1CA2
SCHEMBL17900428 0.61 NPSR1 (0.41) MAPK1SMN1; SMN2L3MBTL1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023119910-A1 RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, ACID GENERATOR, AND COMPOUND JSR株式会社 2023-06-29 — — WO disclosed
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