SCHEMBL23843700

SCHEMBL23843700

O=C(CNS(=O)(=O)C(F)(F)F)Oc1ccc(I)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 1/20 0.37
▸ TRPV1 Q8NER1 2/20 0.37
▸ KMT2A Q03164 3/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ HTT P42858 1/20 0.37
▸ HSD17B10 Q99714 1/20 0.37
▸ CA2 P00918 6/20 0.35
▸ CA1 P00915 5/20 0.35
▸ CA9 Q16790 2/20 0.35
▸ CA12 O43570 1/20 0.35
▸ SMN1; SMN2 Q16637 2/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ OPRK1 P41145 1/20 0.31
▸ RXRA P19793 1/20 0.31
▸ RXRB P28702 1/20 0.31
▸ ESR1 P03372 1/20 0.31
▸ RECQL P46063 1/20 0.31
▸ HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23843702 0.83 GFPT1 (0.37) KMT2AALDH1A1LMNAMAPTMMP2
SCHEMBL23843646 0.78 CA2 (0.31) CA2
SCHEMBL26068008 0.77 IDO1 (0.40) CA2CA1CA12MAPK1
SCHEMBL26343833 0.77 PTPN1 (0.40) PTPN1TRPV1CA2CA1CA9
SCHEMBL24054838 0.75 MMP2 (0.50) ALDH1A1SMN1; SMN2MMP2MMP9MMP1
SCHEMBL25803086 0.73 ELANE (0.43) PTPN1TRPV1CA2CA1CA9
SCHEMBL24054862 0.73 KMT2A (0.51) KMT2AALDH1A1MAPTSMN1; SMN2
SCHEMBL26343095 0.72 KMT2A (0.41) TRPV1KMT2AALDH1A1LMNAMAPT
SCHEMBL28214445 0.71 KMT2A (0.40) TRPV1KMT2AALDH1A1LMNAMAPT
SCHEMBL25802460 0.70 KDM4E (0.42) PTPN1TRPV1KMT2AALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11860540-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-02 — — US disclosed
US-11860540-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-02 — — US disclosed
US-11733608-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-22 — — US disclosed
US-11733608-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-22 — — US disclosed
US-20210364921-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-25 — — US disclosed
US-20210294211-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-23 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210294211-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, INSR, BICRA PTPN1 425/4885TRPV1 3190/4885KMT2A 1948/4885
US-11733608-B2 Resist composition and patterning process HNRNPU, INSR, BICRA PTPN1 425/4885TRPV1 3190/4885KMT2A 1948/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback