⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16975151 | 0.91 | — | — | |
| SCHEMBL4388794 | 0.85 | — | — | |
| SCHEMBL21722126 | 0.85 | — | — | |
| SCHEMBL8635139 | 0.85 | — | — | |
| SCHEMBL27608705 | 0.85 | — | — | |
| SCHEMBL9213223 | 0.83 | — | — | |
| SCHEMBL14108975 | 0.83 | CYP1A2 (0.38) | — | |
| SCHEMBL14109108 | 0.83 | CYP1A2 (0.38) | — | |
| SCHEMBL646385 | 0.82 | — | — | |
| SCHEMBL8676104 | 0.81 | SIGMAR1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11535693-B2 | Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2022-12-27 | — | — | US | claimed |
| US-20210155739-A1 | Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2021-05-27 | — | — | US | claimed |
| EP-0994855-A1 | LIGHT-STABILIZING SYNERGIC MIXTURES FOR ORGANIC POLYMERS | Great Lakes Chemical (Europe) GmbH (CH) | 2000-04-26 | — | — | EP | claimed |
| WO-1999002495-A1 | LIGHT-STABILIZING SYNERGIC MIXTURES FOR ORGANIC POLYMERS | GREAT LAKES CHEMICAL (EUROPE) GMBH (CH) | 1999-01-21 | — | — | WO | claimed |
| US-11535693-B2 | Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2022-12-27 | — | — | US | disclosed |
| US-20210155739-A1 | Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2021-05-27 | — | — | US | disclosed |
| CN-106459319-B | Photocurable sealant compositions, their preparation and their use | 亨斯迈先进材料特许（瑞士）有限公司 | 2020-01-03 | — | — | CN | disclosed |
| EP-3140336-A1 | A PHOTOCURABLE SEALING AGENT COMPOSITION, ITS PREPARATION AND ITS USE | Huntsmann Advanced Materials Licensing (Switzerland) GmbH (CH) | 2017-03-15 | — | — | EP | disclosed |
| US-20170058069-A1 | A Photocurable Sealing Agent Composition, Its Preparation and Its Use | HUNTSMAN INTERNATIONAL LLC | 2017-03-02 | — | — | US | disclosed |
| WO-2015169561-A1 | A PHOTOCURABLE SEALING AGENT COMPOSITION, ITS PREPARATION AND ITS USE | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2015-11-12 | — | — | WO | disclosed |
| US-20150291728-A1 | EPOXY COMPOUND, PRODUCTION METHOD THEREFOR, AND CURABLE EPOXY RESIN COMPOSITION | DAICEL CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| EP-2921513-A1 | EPOXY COMPOUND, PRODUCTION METHOD THEREFOR, AND CURABLE EPOXY RESIN COMPOSITION | Daicel Corporation (JP) | 2015-09-23 | — | — | EP | disclosed |
| US-20140117280-A1 | OXYGEN ABSORBER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-05-01 | — | — | US | disclosed |
| EP-2711077-A1 | OXYGEN ABSORBER | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-03-26 | — | — | EP | disclosed |
| US-8049018-B2 | Methine dyes and uses of the same | KABUSHIKI KAISHA HAYASHIBARA SEIBUTSU KAGAKU KENKYUJO (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20090076278-A1 | METHINE DYES AND USES OF THE SAME | KABUSHIKI KAISHA HAYASHIBARA SEIBUTSU KAGAKU KENKYUJO (JP) | 2009-03-19 | — | — | US | disclosed |