⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3396417 | 0.91 | — | — | |
| SCHEMBL263382 | 0.83 | — | — | |
| SCHEMBL2581093 | 0.82 | — | — | |
| SCHEMBL6531207 | 0.81 | — | — | |
| SCHEMBL28189707 | 0.81 | — | — | |
| SCHEMBL61990 | 0.78 | — | — | |
| SCHEMBL42612 | 0.78 | — | — | |
| SCHEMBL3316839 | 0.78 | — | — | |
| SCHEMBL28840657 | 0.78 | — | — | |
| SCHEMBL3163054 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 613 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3649169-B1 | URETHANE METHACRYLATE COMPOUNDS CONTAINING REACTIVE RESINS, AND REACTIVE RESIN SYSTEMS AND THEIR USE | HILTI AG (LI) | 2024-03-20 | — | — | EP | claimed |
| US-11535693-B2 | Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2022-12-27 | — | — | US | claimed |
| US-11459422-B2 | Reactive resins containing urethane methacrylate compounds, reactive resin components and reactive resin systems and use thereof | HILTI AKTIENGESELLSCHAFT (LI) | 2022-10-04 | — | — | US | claimed |
| US-20210155739-A1 | Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2021-05-27 | — | — | US | claimed |
| CN-107207700-B | Method for synthesizing polyoxazolidone compound with high stability | 科思创德国股份有限公司 | 2021-04-27 | — | — | CN | claimed |
| US-20210079152-A1 | REACTIVE RESINS CONTAINING URETHANE METHACRYLATE COMPOUNDS, REACTIVE RESIN COMPONENTS AND REACTIVE RESIN SYSTEMS AND USE THEREOF | HILTI AKTIENGESELLSCHAFT (LI) | 2021-03-18 | — | — | US | claimed |
| EP-3649169-A1 | REACTIVE RESINS CONTAINING URETHANE METHACRYLATE COMPOUNDS, REACTIVE RESIN COMPONENTS AND REACTIVE RESIN SYSTEMS AND USE THEREOF | Hilti Aktiengesellschaft (LI) | 2020-05-13 | — | — | EP | claimed |
| US-10385167-B2 | Process for the synthesis of polyoxazolidinone compounds with high stability | COVESTRO DEUTSCHLAND AG (DE) | 2019-08-20 | — | — | US | claimed |
| EP-3256508-B1 | PROCESS FOR THE SYNTHESIS OF POLYOXAZOLIDINONE COMPOUNDS WITH HIGH STABILITY | COVESTRO DEUTSCHLAND AG (DE) | 2019-03-27 | — | — | EP | claimed |
| US-20180022871-A1 | PROCESS FOR THE SYNTHESIS OF POLYOXAZOLIDINONE COMPOUNDS WITH HIGH STABILITY | COVESTRO DEUTSCHLAND AG (DE) | 2018-01-25 | — | — | US | claimed |
| EP-0319480-A2 | Process for the methylation of triazine compounds containing 2,2,6,6-tetramethylpiperidine groups | CIBA-GEIGY AG (CH) | 1989-06-07 | — | — | EP | claimed |
| EP-0302020-A2 | Process for the preparation of 2,2,6,6-tetramethyl-4-piperidyl-amines | CIBA-GEIGY AG (CH) | 1989-02-01 | — | — | EP | claimed |
| EP-0292437-A2 | Piperidylaminotriazine derivatives and their use as stabilizers | CIBA-GEIGY AG (CH) | 1988-11-23 | — | — | EP | claimed |
| EP-0250363-A2 | Triazine derivatives of piperidinylamidines | CIBA-GEIGY AG (CH) | 1987-12-23 | — | — | EP | claimed |
| EP-0250248-A2 | Block copolymer, method of making the same, diamine precursors of the same method, method of making such diamines and end products comprising the block copolymer | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1987-12-23 | — | — | EP | claimed |
| US-4424366-A | PHOTOCROSSLINKABLE POLYMERS | CIBA-GEIGY CORPORATION (US) | 1984-01-03 | — | — | US | claimed |
| US-4418199-A | PHOTOCROSSLINKING AGENTS | CIBA-GEIGY CORPORATION (US) | 1983-11-29 | — | — | US | claimed |
| US-4418200-A | PHOTOCROSSLINKING AGENTS | CIBA-GEIGY CORPORATION (US) | 1983-11-29 | — | — | US | claimed |
| US-4414394-A | PHOTOCROSSLINKABLE POLYMERS FOR OFFSET PRINTING PLATES AND PHOTORESISTS | CIBA-GEIGY CORPORATION (US) | 1983-11-08 | — | — | US | claimed |
| US-4337200-A | INTERMEDIATES FOR PHOTORESISTS | CIBA-GEIGY CORPORATION (US) | 1982-06-29 | — | — | US | claimed |