SCHEMBL2581349

SCHEMBL2581349

C=CC(=O)Oc1ccccc1[SiH](C)C

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 4/20 0.49
THRA P10827 1/20 0.49
KDM4E B2RXH2 4/20 0.39
HPGD P15428 3/20 0.39
HSD17B10 Q99714 3/20 0.39
MAPT P10636 2/20 0.39
TYMS P04818 1/20 0.38
LIG1 P18858 1/20 0.33
AKT1 P31749 1/20 0.33
ALDH1A1 P00352 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
TSHR P16473 2/20 0.33
ESR1 P03372 2/20 0.33
ITGB3 P05106 1/20 0.33
ITGA2B P08514 1/20 0.33
HMGB1 P09429 1/20 0.33
GGT1 P19440 1/20 0.33
PTGS1 P23219 1/20 0.33
PTGS2 P35354 1/20 0.33
BLM P54132 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2577809 0.85 THRB (0.46) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL2577758 0.83 THRB (0.47) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL2580884 0.83 THRB (0.49) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL29413361 0.81 THRB (0.56) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL3841280 0.81 THRB (0.56) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL2579936 0.80 THRB (0.50) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL10951444 0.80 HSD17B10 (0.43) KDM4EHPGDHSD17B10MAPTALDH1A1
SCHEMBL31364528 0.77 THRB (0.50) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL16987295 0.77 THRB (0.50) THRBTHRAKDM4EHPGDHSD17B10
SCHEMBL1719098 0.77 ELANE (0.46) KDM4EHPGDHSD17B10MAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8048615-B2 Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-11-01 US disclosed
US-20090162782-A1 Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-06-25 US disclosed
EP-1972998-A1 SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM Nissan Chemical Industries, Ltd. (JP) 2008-09-24 EP disclosed