Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 5/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | NPY2R | P49146 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13430797 | 0.80 | MMP8 (0.32) | — | |
| SCHEMBL25819543 | 0.77 | CHRM2 (0.37) | MEN1KMT2AKDM4EALDH1A1CHRM2 | |
| SCHEMBL21192215 | 0.75 | CHRM2 (0.40) | MEN1KMT2AKDM4EALDH1A1CHRM2 | |
| SCHEMBL14400169 | 0.73 | — | — | |
| SCHEMBL9300398 | 0.69 | MMP8 (0.31) | — | |
| SCHEMBL25747740 | 0.68 | KCNH2 (0.36) | KDM4EALDH1A1CHRM2CHRM4CHRM5 | |
| SCHEMBL2611009 | 0.67 | MEN1 (0.42) | MEN1KMT2AKDM4EALDH1A1CHRM2 | |
| SCHEMBL22621651 | 0.65 | MEN1 (0.42) | MEN1KMT2AKDM4EALDH1A1CHRM2 | |
| SCHEMBL21192211 | 0.64 | CHRM2 (0.43) | MEN1KMT2AKDM4EALDH1A1CHRM2 | |
| SCHEMBL8992314 | 0.64 | MEN1 (0.40) | MEN1KMT2AKDM4EALDH1A1CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023126259-A1 | ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A DEFECT REDUCTION AGENT | BASF SE (DE) | 2023-07-06 | — | — | WO | disclosed |