Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | ESR1 | P03372 | 6/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 3/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.31 |
| ▸ | JAK2 | O60674 | 1/20 | 0.31 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25844800 | 0.95 | SLC2A1 (0.33) | ALDH1A1SMN1; SMN2MEN1KMT2AMAPT | |
| SCHEMBL25845033 | 0.87 | GAA (0.32) | GAAALDH1A1SMN1; SMN2ESR1ESR2 | |
| SCHEMBL25844996 | 0.82 | PKM (0.35) | ALDH1A1SMN1; SMN2MEN1KMT2AMAPT | |
| SCHEMBL25844803 | 0.82 | — | — | |
| SCHEMBL25844820 | 0.82 | — | — | |
| SCHEMBL25844806 | 0.81 | — | — | |
| SCHEMBL25844798 | 0.80 | ELANE (0.40) | MAPTPOLBELANE | |
| SCHEMBL2605926 | 0.78 | HSD17B10 (0.49) | GAAALDH1A1HSD17B10PGRPTGS1 | |
| SCHEMBL25844831 | 0.77 | ELANE (0.35) | GAAALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL25845031 | 0.76 | PKM (0.38) | ALDH1A1SMN1; SMN2MEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |