Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | PKM | P14618 | 2/20 | 0.33 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25844834 | 0.95 | GAA (0.32) | MEN1KMT2AELANEALDH1A1MAPT | |
| SCHEMBL25844996 | 0.87 | PKM (0.35) | SLC2A1TSHRPKMNCEH1NPC1 | |
| SCHEMBL25844831 | 0.83 | ELANE (0.35) | SLC2A1TSHRPKMNPC1RAB9A | |
| SCHEMBL25845033 | 0.82 | GAA (0.32) | PKMMEN1KMT2AELANEALDH1A1 | |
| SCHEMBL25844803 | 0.82 | — | — | |
| SCHEMBL25844820 | 0.82 | — | — | |
| SCHEMBL25845031 | 0.81 | PKM (0.38) | SLC2A1TSHRPKMNPC1RAB9A | |
| SCHEMBL25844806 | 0.81 | — | — | |
| SCHEMBL25844798 | 0.80 | ELANE (0.40) | PKML3MBTL1ELANEMAPT | |
| SCHEMBL25844818 | 0.79 | CA2 (0.32) | TSHRL3MBTL1ELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |