SCHEMBL25844941

SCHEMBL25844941

CC(C)(Br)C(=O)OC1CCCC(C(=O)OC(CS(=O)(=O)O)C(F)(F)F)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25844738 0.89 — —
SCHEMBL26312796 0.83 — —
SCHEMBL18775634 0.80 HTT (0.32) —
SCHEMBL20008874 0.79 EPHX2 (0.31) —
SCHEMBL24452520 0.77 TP53 (0.32) —
SCHEMBL17717460 0.77 ADRB2 (0.33) —
SCHEMBL17717458 0.76 ALDH1A1 (0.33) —
SCHEMBL18775650 0.76 ALDH1A1 (0.33) —
SCHEMBL18775689 0.76 ALDH1A1 (0.33) —
SCHEMBL24861569 0.76 ALDH1A1 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709426-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
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