Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | PRKCA | P17252 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25844795 | 0.90 | NPSR1 (0.34) | NPSR1ALDH1A1LMNAPRKCAPKM | |
| SCHEMBL25844986 | 0.81 | NPSR1 (0.35) | NPSR1ALDH1A1LMNATP53L3MBTL1 | |
| SCHEMBL25844993 | 0.81 | NPSR1 (0.41) | NPSR1ALDH1A1LMNATP53L3MBTL1 | |
| SCHEMBL25844989 | 0.79 | NPSR1 (0.38) | NPSR1ALDH1A1LMNATP53L3MBTL1 | |
| SCHEMBL18232610 | 0.78 | ALDH1A1 (0.48) | NPSR1ALDH1A1LMNAPRKCAL3MBTL1 | |
| SCHEMBL18232584 | 0.78 | PRKCA (0.51) | NPSR1ALDH1A1LMNAPRKCAMEN1 | |
| SCHEMBL25844956 | 0.76 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| SCHEMBL18775967 | 0.73 | CLK1 (0.32) | NPSR1 | |
| SCHEMBL18775993 | 0.73 | NPSR1 (0.44) | NPSR1ALDH1A1LMNAL3MBTL1MEN1 | |
| SCHEMBL26312820 | 0.73 | NPSR1 (0.38) | NPSR1ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |