⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14208684 | 0.89 | HMGCR (0.30) | — | |
| SCHEMBL14209152 | 0.84 | — | — | |
| SCHEMBL25844748 | 0.80 | — | — | |
| SCHEMBL27047695 | 0.79 | — | — | |
| SCHEMBL16812046 | 0.77 | — | — | |
| SCHEMBL25564556 | 0.76 | — | — | |
| SCHEMBL13324967 | 0.74 | HMGCR (0.33) | — | |
| SCHEMBL16812048 | 0.74 | — | — | |
| SCHEMBL13596137 | 0.72 | HMGCR (0.33) | — | |
| SCHEMBL18155726 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |