SCHEMBL25845182

SCHEMBL25845182

CC(I)C(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OCC(F)(F)CS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23519203 0.81 — —
SCHEMBL22402813 0.79 FABP7 (0.32) —
SCHEMBL23519224 0.79 — —
SCHEMBL12018699 0.78 FABP7 (0.32) —
SCHEMBL18232573 0.78 — —
SCHEMBL23974026 0.77 — —
SCHEMBL19261160 0.75 KMT2A (0.33) —
SCHEMBL10134898 0.75 — —
SCHEMBL22306964 0.74 — —
SCHEMBL10134888 0.74 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709426-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
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