SCHEMBL22402813

SCHEMBL22402813

CCC(I)C(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OCC(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
FABP7 O15540 1/20 0.32
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19261160 0.91 KMT2A (0.33) KMT2A
SCHEMBL23519203 0.90
SCHEMBL12018699 0.89 FABP7 (0.32) FABP7KMT2A
SCHEMBL18844980 0.87 ALDH1A1 (0.33) KMT2A
SCHEMBL22402808 0.87
SCHEMBL19261158 0.86
SCHEMBL19335813 0.85
SCHEMBL18844964 0.84
SCHEMBL20811059 0.84
SCHEMBL18845056 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11009793-B2 Monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-18 US disclosed
US-20200369605-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-11-26 US disclosed
US-20200283400-A1 EPOXY COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200369605-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS PAG1, SLC6A5, LBR FABP7 4479/4885KMT2A 1890/4885
US-20200283400-A1 EPOXY COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS RER1, SLC11A2, EEF1A1 FABP7 3792/4885KMT2A 2768/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.