Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.43 |
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | BLM | P54132 | 1/20 | 0.43 |
| ▸ | AGER | Q15109 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | ASPH | Q12797 | 2/20 | 0.40 |
| ▸ | KDM8 | Q8N371 | 2/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | IDO1 | P14902 | 1/20 | 0.37 |
| ▸ | LCK | P06239 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29110843 | 0.97 | ALDH1A1 (0.41) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| SCHEMBL30660932 | 0.97 | ALDH1A1 (0.41) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| SCHEMBL3810886 | 0.87 | ALDH1A1 (0.35) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| Pyrrole SCHEMBL28313282 | 0.85 | KDM4E (0.38) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| SCHEMBL9315436 | 0.84 | SMN1; SMN2 (0.50) | ALDH1A1KDM4ESMN1; SMN2LCKCA12 | |
| SCHEMBL2805794 | 0.82 | IKBKB (0.39) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| SCHEMBL3875708 | 0.80 | ALDH1A1 (0.38) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| SCHEMBL30447160 | 0.79 | SMN1; SMN2 (0.50) | ALDH1A1KDM4ESMN1; SMN2KEAP1NFE2L2 | |
| SCHEMBL2271379 | 0.79 | ALDH1A1 (0.45) | ALDH1A1KDM4ETSHRALOX15MAPT | |
| SCHEMBL8591590 | 0.77 | KEAP1 (0.46) | ALDH1A1KDM4ETSHRL3MBTL1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1810 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118619502-B | Method for treating port chemical wastewater | 交通运输部天津水运工程科学研究所 | 2024-10-22 | — | — | CN | claimed |
| CN-118619502-A | Method for treating port chemical wastewater | 交通运输部天津水运工程科学研究所 | 2024-09-10 | — | — | CN | claimed |
| CN-115926218-B | Aromatic imide film | 宁波博雅聚力新材料科技有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-115232017-B | Compound, resin and preparation method and application thereof | 华为技术有限公司 | 2024-06-18 | — | — | CN | claimed |
| CN-118047948-A | Resin, preparation method thereof and resin composition | 华为技术有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-117304037-A | Diamine monomer, preparation method thereof, resin and application thereof | 华为技术有限公司 | 2023-12-29 | — | — | CN | claimed |
| EP-3143067-B1 | MULTIFUNCTIONAL POLYAMIDES FOR PROTECTIVE COATINGS | HUNTSMAN ADVANCED MAT AMERICAS LLC (US) | 2023-09-13 | — | — | EP | claimed |
| CN-114621437-B | Compound for preparing photosensitive resin film, preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2023-08-18 | — | — | CN | claimed |
| CN-115926218-A | Aromatic imide film | 宁波博雅聚力新材料科技有限公司 | 2023-04-07 | — | — | CN | claimed |
| US-20230091989-A1 | DIAMINE MONOMER COMPOUND, METHOD FOR PREPARING THE SAME, RESIN, FLEXIBLE FILM, AND ELECTRONIC DEVICE | Zhen Ding Technology Co., Ltd. (TW) | 2023-03-23 | — | — | US | claimed |
| WO-1991001340-A1 | POLYIMIDES COMPRISING SUBSTITUTED BENZIDINES | THE UNIVERSITY OF AKRON (US) | 1991-02-07 | — | — | WO | claimed |
| US-4847358-A | HEAT RESISTANT ELECTRONICS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1989-07-11 | — | — | US | claimed |
| US-4758476-A | Polyimide precursor resin composition and semiconductor device using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1988-07-19 | — | — | US | claimed |
| EP-0260833-A2 | Process for producing polyamide acid having siloxane bonds and polyimide having siloxane bonds and isoindoloquinazolinedione rings | HITACHI CHEMICAL COMPANY (JP) | 1988-03-23 | — | — | EP | claimed |
| EP-0251828-A1 | Insulating resin composition and semiconductor device using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-01-07 | — | — | EP | claimed |
| EP-0184937-A2 | Polyimide precursor resin composition and semiconductor device using the same | Hitachi Chemical Co., Ltd. (JP) | 1986-06-18 | — | — | EP | claimed |
| US-4485234-A | FROM DIAMINE, DIANHYDRIDE, AND DIAMINECARBONAMIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1984-11-27 | — | — | US | claimed |
| US-4447596-A | REACTING DIAMINE AND DIANHYDRIDE AT LOW TEMPERATURE, THEN ADJUSTMENT OF VISCOSITY BY HEATING | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1984-05-08 | — | — | US | claimed |
| US-4381886-A | HYDRAZIDE-IMIDE COPOLYMER | HITACHI, LTD. (JP) | 1983-05-03 | — | — | US | claimed |
| US-4338427-A | HEAT, WEAR, AND CHEMICAL RESISTANCE | HITACHI CHEMICAL COMPANY LTD. (JP) | 1982-07-06 | — | — | US | claimed |