SCHEMBL25864476

SCHEMBL25864476

c1ccc(Oc2ccc(C(c3ccccc3)c3ccc(Oc4ccccc4)cc3)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 5/20 0.60
TSHR P16473 1/20 0.60
NR1H2 P55055 1/20 0.52
BAX Q07812 1/20 0.52
MAOA P21397 1/20 0.52
SRD5A2 P31213 1/20 0.50
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
SLC6A2 P23975 1/20 0.46
SLC6A4 P31645 1/20 0.46
SLC6A3 Q01959 1/20 0.46
PTGS1 P23219 1/20 0.44
OPRM1 P35372 1/20 0.44
OPRD1 P41143 1/20 0.44
OPRK1 P41145 1/20 0.44
OPRL1 P41146 1/20 0.44
GSTP1 P09211 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13326419 1.00 LTA4H (0.60) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL5773589 0.97 LTA4H (0.55) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL31409222 0.87 MAOA (0.75) LTA4HTSHRMAOA
SCHEMBL9767941 0.87 MAOA (0.68) LTA4HTSHRMAOA
SCHEMBL22566798 0.87 HTT (0.52) LTA4HTSHRSRD5A2SLC6A4
SCHEMBL2498568 0.83 LTA4H (0.57) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL477692 0.81 SRD5A2 (0.72) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL22129853 0.81 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL3893562 0.81 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL2956444 0.81 SLC6A2 (0.63) TSHRSLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed
EP-4215988-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-26 EP disclosed