SCHEMBL25865365

SCHEMBL25865365

Cc1cc([SH]2CCCCC2)ccc1C(C)(C)C

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26156858 0.79 POLB (0.30)
SCHEMBL28150786 0.74 ESR1 (0.44)
SCHEMBL25595291 0.71 TSHR (0.41) HTT
SCHEMBL26081020 0.70
SCHEMBL25477057 0.69 TSHR (0.42) HTT
SCHEMBL25477065 0.68 ACHE (0.40)
SCHEMBL27893504 0.67 ACHE (0.44) L3MBTL1
SCHEMBL114856 0.65 TDP1 (0.44) HTTL3MBTL1
SCHEMBL21288350 0.65 TSHR (0.48) L3MBTL1
SCHEMBL29039139 0.65 CA1 (0.44) HTTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023140386-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 東京応化工業株式会社 2023-07-27 WO disclosed