SCHEMBL25889183

SCHEMBL25889183

O=C(OC(F)(F)C(F)(F)S(=O)(=O)O)C1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.34
CES1 P23141 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
POLB P06746 2/20 0.33
ELANE P08246 1/20 0.33
RAB9A P51151 2/20 0.31
ATM Q13315 1/20 0.31
HTT P42858 1/20 0.31
KMT2A Q03164 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
ENPP3 O14638 3/20 0.30
ENPP2 Q13822 2/20 0.30
ENPP1 P22413 2/20 0.30
ALDH1A1 P00352 2/20 0.30
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26190805 0.85 SMN1; SMN2 (0.35) CES2CES1SMN1; SMN2POLBELANE
SCHEMBL26190675 0.82 SMN1; SMN2 (0.36) CES2CES1SMN1; SMN2POLBELANE
SCHEMBL2531580 0.81 CHRM2 (0.32) CES2CES1CHRM2CHRM4CHRM1
SCHEMBL21136603 0.78 CES2 (0.33) CES2CES1SMN1; SMN2HTTKMT2A
SCHEMBL21136606 0.77 SMN1; SMN2 (0.34) CES2CES1SMN1; SMN2ALDH1A1CHRM2
SCHEMBL21135767 0.76 ALDH1A1 (0.37) CES2CES1SMN1; SMN2KMT2AENPP3
SCHEMBL27165008 0.75 CES2 (0.44) CES2CES1SMN1; SMN2POLBELANE
SCHEMBL18467940 0.75 CES2 (0.37) CES2CES1SMN1; SMN2POLBELANE
SCHEMBL21136608 0.74 ALDH1A1 (0.34) CES2CES1SMN1; SMN2POLBELANE
SCHEMBL21136611 0.73 ALDH1A1 (0.33) SMN1; SMN2ALDH1A1CASP3SENP8SENP7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230280652-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND JSR CORPORATION (JP) 2023-09-07 US disclosed
US-11709428-B2 Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound JSR CORPORATION (JP) 2023-07-25 US disclosed