SCHEMBL25897253

SCHEMBL25897253

Cc1cc([SH](c2ccccc2)c2ccccc2)cc(C)c1OCC(=O)OC1C2CC3C(O)OC1C3C2

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25629384 0.84 ALDH1A1 (0.30)
SCHEMBL26085289 0.84 ALDH1A1 (0.30)
SCHEMBL25629393 0.83 KMT2A (0.30) KMT2A
SCHEMBL25837668 0.79 ALDH1A1 (0.30)
SCHEMBL25629386 0.77 ALDH1A1 (0.32) KMT2A
SCHEMBL25629389 0.76 KMT2A (0.30) KMT2A
SCHEMBL25629409 0.74 MMP1 (0.31)
SCHEMBL25657999 0.71 MMP1 (0.49) KMT2A
SCHEMBL25629410 0.71 KMT2A (0.47) KMT2A
SCHEMBL25629330 0.71 KMT2A (0.41) KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023223865-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2023-11-23 WO disclosed
WO-2023171739-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND 東京応化工業株式会社 2023-09-14 WO disclosed
WO-2023140364-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER 東京応化工業株式会社 2023-07-27 WO disclosed