SCHEMBL25899377

SCHEMBL25899377

CCC(C)c1ccc(C(=O)OC(C)(C)c2ccncc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.43
▸ TSHR P16473 2/20 0.43
▸ RAB9A P51151 3/20 0.41
▸ NPC1 O15118 2/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.41
▸ TP53 P04637 2/20 0.41
▸ NPSR1 Q6W5P4 2/20 0.41
▸ CYP17A1 P05093 1/20 0.40
▸ CYP19A1 P11511 1/20 0.40
▸ KMT2A Q03164 5/20 0.39
▸ MEN1 O00255 2/20 0.39
▸ NAMPT P43490 1/20 0.39
▸ GAA P10253 2/20 0.38
▸ ADRB2 P07550 1/20 0.38
▸ ADRB1 P08588 1/20 0.38
▸ ADRB3 P13945 1/20 0.38
▸ LMNA P02545 2/20 0.37
▸ MAPT P10636 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ NTRK1 P04629 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13704323 0.86 ALDH1A1 (0.48) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2
SCHEMBL13704334 0.85 TSHR (0.43) ALDH1A1TSHRRAB9ANPC1NPSR1
SCHEMBL25899385 0.85 ALDH1A1 (0.42) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2
SCHEMBL13704321 0.84 TSHR (0.43) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2
SCHEMBL13704332 0.84 ALDH1A1 (0.43) ALDH1A1TSHRSMN1; SMN2TP53NPSR1
SCHEMBL14827404 0.84 ALDH1A1 (0.44) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2
SCHEMBL13704333 0.81 ALDH1A1 (0.42) ALDH1A1TSHRRAB9ANPC1TP53
SCHEMBL13704326 0.81 ALDH1A1 (0.42) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2
SCHEMBL6367420 0.80 TSHR (0.47) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2
SCHEMBL25906959 0.80 CYP17A1 (0.39) NPC1SMN1; SMN2NPSR1CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709427-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
US-11709427-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11709427-B2 Positive resist composition and pattern forming process EWSR1, PARG, VIM ALDH1A1 3639/4885TSHR 4671/4885RAB9A 1736/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback