SCHEMBL25906211

SCHEMBL25906211

C=C(C)c1ccccc1S

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.50
HDAC8 Q9BY41 1/20 0.50
ADRA2A P08913 1/20 0.35
ADRA2B P18089 1/20 0.35
ADRA2C P18825 1/20 0.35
HPGD P15428 1/20 0.33
MEN1 O00255 1/20 0.33
NPC1 O15118 1/20 0.33
KMT2A Q03164 1/20 0.33
CLCN2 P51788 1/20 0.33
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA9 Q16790 2/20 0.33
CA5A P35218 1/20 0.33
CA5B Q9Y2D0 1/20 0.33
MDM4 O15151 1/20 0.32
TP53 P04637 1/20 0.32
ALDH1A1 P00352 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29434165 0.81 MEN1 (0.40) MAPTADRA2AADRA2BADRA2CHPGD
SCHEMBL107161 0.81 MEN1 (0.40) MAPTADRA2AADRA2BADRA2CHPGD
SCHEMBL23691520 0.79 MAPT (0.35) MAPTHDAC8
SCHEMBL4426071 0.78 MEN1 (0.39) MAPTADRA2AADRA2BADRA2CHPGD
SCHEMBL30622076 0.78 MEN1 (0.39) MAPTADRA2AADRA2BADRA2CHPGD
SCHEMBL6003981 0.78 MEN1 (0.39) MAPTADRA2AADRA2BADRA2CHPGD
Lithium SCHEMBL6003985 0.78 MEN1 (0.39) MAPTADRA2AADRA2BADRA2CHPGD
Hydrogen Peroxide SCHEMBL28416110 0.78 ALDH1A1 (0.43) HPGDMEN1NPC1KMT2ACLCN2
Hydrogen Sulfide SCHEMBL26644763 0.78 MEN1 (0.39) MAPTADRA2AADRA2BADRA2CHPGD
SCHEMBL18030779 0.77 MAPT (0.58) MAPTHDAC8HPGDCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023145488-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-08-03 WO disclosed