Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CRBN | Q96SW2 | 18/20 | 0.40 |
| ▸ | DDB1 | Q16531 | 14/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.37 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | IKZF3 | Q9UKT9 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | TNF | P01375 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31435687 | 0.85 | CRBN (0.40) | CRBNDDB1POLB | |
| SCHEMBL22623767 | 0.80 | CRBN (0.44) | CRBNDDB1POLBALDH1A1CHRM2 | |
| SCHEMBL10073932 | 0.80 | CRBN (0.44) | CRBNDDB1POLBALDH1A1CHRM2 | |
| SCHEMBL25046231 | 0.80 | CRBN (0.44) | CRBNDDB1POLBALDH1A1CHRM2 | |
| Hydrochloric Acid SCHEMBL2111827 | 0.76 | CRBN (0.41) | CRBNDDB1POLBALDH1A1CHRM2 | |
| SCHEMBL25863629 | 0.74 | CRBN (0.43) | CRBNDDB1POLB | |
| SCHEMBL24315849 | 0.69 | CRBN (0.41) | CRBNDDB1POLB | |
| SCHEMBL11855537 | 0.69 | CRBN (0.50) | CRBNDDB1POLBALDH1A1CHRM2 | |
| SCHEMBL26274093 | 0.69 | CRBN (0.43) | CRBNDDB1POLBALDH1A1 | |
| SCHEMBL26955412 | 0.68 | CRBN (0.43) | CRBNDDB1POLBCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230236502-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-27 | — | — | US | disclosed |