SCHEMBL25913780

SCHEMBL25913780

BCc1c(B)c(C(=O)O)c(C(=O)O/C=C/C(=O)OCCS(=O)(=O)O)c(CB)c1CB

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25476277 0.94 — —
SCHEMBL25528060 0.93 — —
SCHEMBL25913793 0.85 — —
SCHEMBL25913779 0.79 — —
SCHEMBL25528037 0.78 — —
SCHEMBL25476263 0.77 — —
SCHEMBL25913775 0.77 — —
SCHEMBL19756106 0.77 — —
SCHEMBL25913774 0.75 STS (0.34) —
SCHEMBL25913787 0.73 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236503-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-27 — — US disclosed
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