⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25913780 | 0.93 | — | — | |
| SCHEMBL25476277 | 0.90 | — | — | |
| SCHEMBL25528037 | 0.85 | — | — | |
| SCHEMBL25528056 | 0.79 | — | — | |
| SCHEMBL25913793 | 0.78 | — | — | |
| SCHEMBL25528063 | 0.77 | — | — | |
| SCHEMBL19756106 | 0.77 | — | — | |
| SCHEMBL25527870 | 0.77 | — | — | |
| SCHEMBL25527951 | 0.76 | — | — | |
| SCHEMBL25528072 | 0.75 | STS (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |