SCHEMBL25913793

SCHEMBL25913793

BCc1c(B)c(C(=O)O)c(C(=O)OCCS(=O)(=O)O)c(CB)c1CB

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25913779 0.93 — —
SCHEMBL25528037 0.92 — —
SCHEMBL25476263 0.91 — —
SCHEMBL25913789 0.86 SMN1; SMN2 (0.33) —
SCHEMBL25913787 0.86 — —
SCHEMBL25913780 0.85 — —
SCHEMBL25913775 0.85 — —
SCHEMBL25913774 0.85 STS (0.34) —
SCHEMBL25737072 0.85 — —
SCHEMBL25528056 0.85 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236503-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-27 — — US disclosed
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