⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25913779 | 0.93 | — | — | |
| SCHEMBL25528037 | 0.93 | — | — | |
| SCHEMBL25476276 | 0.88 | — | — | |
| SCHEMBL25913793 | 0.85 | — | — | |
| SCHEMBL25527951 | 0.83 | — | — | |
| SCHEMBL25528040 | 0.80 | — | — | |
| SCHEMBL25528042 | 0.80 | SMN1; SMN2 (0.33) | — | |
| SCHEMBL25476263 | 0.79 | — | — | |
| SCHEMBL25528060 | 0.79 | — | — | |
| SCHEMBL25528063 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |