SCHEMBL25915966

SCHEMBL25915966

CCC(C)(C)C(=O)OCCCS(=O)(=O)ON1C(=O)c2ccccc2C1=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 8/20 0.41
▸ MAPT P10636 7/20 0.41
▸ KDM4E B2RXH2 6/20 0.41
▸ F2 P00734 4/20 0.41
▸ VDR P11473 3/20 0.41
▸ KMT2A Q03164 6/20 0.39
▸ HPGD P15428 3/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ HTT P42858 2/20 0.39
▸ LMNA P02545 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ XBP1 P17861 2/20 0.38
▸ CYP1A2 P05177 1/20 0.36
▸ CYP3A4 P08684 1/20 0.36
▸ CYP2C19 P33261 1/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ GAA P10253 1/20 0.34
▸ FGFR1 P11362 1/20 0.34
▸ FGFR2 P21802 1/20 0.34
▸ FGFR4 P22455 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25916428 0.79 HTT (0.41) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL11028745 0.77 ALDH1A1 (0.52) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL11199907 0.76 KDM4E (0.51) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL10350200 0.75 SMN1; SMN2 (0.57) ALDH1A1KMT2AHPGDMEN1LMNA
SCHEMBL11025672 0.74 KDM4E (0.50) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL11029444 0.74 KDM4E (0.50) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL2901056 0.74 KDM4E (0.50) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL14648738 0.74 ALDH1A1 (0.43) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL11964032 0.73 ALDH1A1 (0.38) ALDH1A1LMNASMN1; SMN2CYP1A2GAA
SCHEMBL12581019 0.73 ALDH1A1 (0.40) ALDH1A1MAPTKDM4EF2VDR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 — — US disclosed
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